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Supply And Installation Of Rf-Dc Uhv Compatible Sputtering System For The Department Of Physics, Iit Guwahati Rf-Dc Uhv Compatible Sputtering System
Retender Notice Supply Of Multitarget Uhv Sputtering System With Main Chamber And Load Lock With Rf. Main Chamber With Atleast 10 Power-8 Pa Base Pressure Is Required. Inviting Tenders For Multitarget Uhv Sputtering System With Two Chambers, With Atleast 10-8 Pa In Main Chamber.
Gem bids for Sputtering System
Non-comprehensive Amc Of Metal Evaporation System Model 12 Inch Mspt With Rf/dc Sputtering And Thermal Evaporation System
Gem Bids For 1 Rfdc Magnetron Sputtering System
Supply Of Multitarget Uhv Sputtering System
Multi Target Uhv Sputtering System System Should Consist Of Deposition Chamber And Load Lock Chamber With Ultra High Vacuum. Sputtering Chamber Should Be Provided With 6 Sputter Cathodes Of Dc. Load Lock Chamber With A Rf Sputtering Gun. Multitarget Uhv Sputtering System
Supply And Installation Of Magnetron Sputtering System
Supply of 1 Rf Dc Magnetron Sputtering System
Supply of 1 Dc Sputtering System
