Multi Target Uhv Sputtering System System Should Consist Of Deposition Chamber And Load Lock Chamber With Ultra High Vacuum. Sputtering Chamber Should Be Provided With 6 Sputter Cathodes Of Dc. Load Lock Chamber With A Rf Sputtering Gun. Multitarget Uhv Sputtering System
Supply Of Hptlc Automatic Quantitative Applicator Including Pc Tlc Plate Heater Tlc Visualizer And Tlc Densitometer Scanner , Automatic Gradient Multiple Development Chamber With Vacuum Pump And Accessories , Hptlc Ms Interface Pump Adapter Usbrs 232 4 Port And Its Accessories , Mass Detector Includes Esi And Apci Probe Pump Controller Pc With Software And Its Accessories , Solvent Front Monitoring Device , Post Chromatography Visualisation , Hptlc Derivatizer For 20x20 And 20x10 Plate Sizes , Hptlc Method Developmentchamber , Hptlc Silica Gel 60 Glass Backed 10 X 10 Cm 25 Plates Per Box , Tlc Silica Gel 60 F254 Tlc Aluminium Sheet 20 X 20 Cm 25 Plates Per Box , 10 Kva Ups For Hptlc Ms Interface System , Nitrogen Cylinder Regulator With Trap